molybdenum sputtering target
Molybdenum is a shiny, silvery-white metal that occurs in the earth's
crust with a frequency of 1.5 ppm. It resembles tungsten in many ways,
with which it is often paired in the transition series of the periodic
table. The high-strength, tough and hard metal has a silvery-white
sheen. It has the highest melting point of all elements of the 5th
period.
A sputtering target is a high-purity material that is used for
sputtering.
Sputtering targets are used as the starting material for a wide variety
of coating processes, such as B. PVD, laser or ion beam technology
required.
Sputtering targets
We offer one of the largest and most extensive product lines of
sputtering targets. All common geometries (and sizes) are available.
Sputtering targets are used as the starting material for a wide variety
of coating processes, such as B. PVD, laser or ion beam technology
required.
Sputtering targets made from ceramic materials or from compositions that
cannot be produced by melting technology can be produced by powder
metallurgy by pressing powders or powder mixtures and subsequent
sintering or by hot pressing. The homogeneity, composition and purity of
the sputtering target can be set individually.
Sputtering target materials and quality
Our sputtering targets are available in a variety of compositions and in
different purity levels. All sputtering targets are checked for
composition, purity, density and finally for shape and dimensions in all
production stages. By using a wide variety of manufacturing processes
(e.g. powder metallurgy or melt metallurgy), each of which corresponds
to the latest state of the art, we can meet the highest quality
standards. Each production batch goes through different analysis
processes, which include can also be monitored by independent
laboratories.
Sputtering target bonding & backplate manufacturing
Depending on the system or material, your sputtering target must be
bonded. EVOCHEM uses both metallic and nano bond. Both methods enable a
secure and firm, electrically and thermally very conductive connection
between the target and the heat sink. We are also happy to bond your
sputtering targets to the back plates provided.
.
;
.
molybdenum
Cobalt
Iron
Carbon
Sulfur
Copper
Zinc
Lead
Total Impurities
99.99
<0.00002
0.002
<0.01
0.0002
0.00005
0.00005
0.00002
<0.01
Diam
thickness
length
width
purity
Details
Foil
0.03mm -0.8mm
>3000mm
2mm-150mm
99.99%
Details
sheet
0.03mm-50mm
100mm
100mm
99.99%
Details
wire
0.025mm
-0.05mm
7000-8000m
99.99%
Details
Stab
2.0mm
-150mm
<1000mm
99.99%
Details
powder
50nm- 20μm
99.99%
Details
Pellets
6mm-13mm
99.99%
Details
granules
6mm-13mm
99.99%
Details
Sputter
target
3mm-300mm
O30--2000mm
99.99%
Details
crucible
30ml-50ml
99.9%
Details
mesh
0.05-2mm
hole:0.3X0.6mm, 0.5X1mm
............20X40mm
99.9%
Details
Molybdenum is a shiny, silvery-white metal that occurs in the earth's
crust with a frequency of 1.5 ppm. It resembles tungsten in many ways,
with which it is often paired in the transition series of the periodic
table. The high-strength, tough and hard metal has a silvery-white
sheen. It has the highest melting point of all elements of the 5th
period.
A sputtering target is a high-purity material that is used for
sputtering.
Sputtering targets are used as the starting material for a wide variety
of coating processes, such as B. PVD, laser or ion beam technology
required.
Sputtering targets
We offer one of the largest and most extensive product lines of
sputtering targets. All common geometries (and sizes) are available.
Sputtering targets are used as the starting material for a wide variety
of coating processes, such as B. PVD, laser or ion beam technology
required.
Sputtering targets made from ceramic materials or from compositions that
cannot be produced by melting technology can be produced by powder
metallurgy by pressing powders or powder mixtures and subsequent
sintering or by hot pressing. The homogeneity, composition and purity of
the sputtering target can be set individually.
Sputtering target materials and quality
Our sputtering targets are available in a variety of compositions and in
different purity levels. All sputtering targets are checked for
composition, purity, density and finally for shape and dimensions in all
production stages. By using a wide variety of manufacturing processes
(e.g. powder metallurgy or melt metallurgy), each of which corresponds
to the latest state of the art, we can meet the highest quality
standards. Each production batch goes through different analysis
processes, which include can also be monitored by independent
laboratories.
Sputtering target bonding & backplate manufacturing
Depending on the system or material, your sputtering target must be
bonded. EVOCHEM uses both metallic and nano bond. Both methods enable a
secure and firm, electrically and thermally very conductive connection
between the target and the heat sink. We are also happy to bond your
sputtering targets to the back plates provided.
.
;
.
| molybdenum | Cobalt | Iron | Carbon | Sulfur | Copper | Zinc | Lead | Total Impurities | ||
|---|---|---|---|---|---|---|---|---|---|---|
| 99.99 | <0.00002 | 0.002 | <0.01 | 0.0002 | 0.00005 | 0.00005 | 0.00002 | <0.01 |
| Diam | thickness | length | width | purity | Details | ||
|---|---|---|---|---|---|---|---|
|
|
Foil | 0.03mm -0.8mm | >3000mm | 2mm-150mm | 99.99% | Details | |
|
|
sheet | 0.03mm-50mm | 100mm | 100mm | 99.99% | Details | |
|
|
wire | 0.025mm -0.05mm |
7000-8000m | 99.99% | Details | ||
|
|
Stab | 2.0mm -150mm |
<1000mm | 99.99% | Details | ||
|
|
powder | 50nm- 20μm | 99.99% | Details | |||
|
|
Pellets | 6mm-13mm | 99.99% | Details | |||
|
|
granules | 6mm-13mm | 99.99% | Details | |||
|
|
Sputter target |
3mm-300mm | O30--2000mm | 99.99% | Details | ||
|
|
crucible | 30ml-50ml | 99.9% | Details | |||
|
|
mesh | 0.05-2mm | hole:0.3X0.6mm, 0.5X1mm ............20X40mm |
99.9% | Details | ||